Hsiao-Chien Chen, Fu-Der Mai, Kuang-Hsuan Yang, Hui-Yen Tsai, Chih-Ping Yang, Chien-Chung Chen, Chao-Hsuan Chen, Yu-Chuan Liu
Hsiao-Chien Chen 1
Fu-Der Mai 2
Kuang-Hsuan Yang 3 Hui-Yen Tsai 1Chih-Ping Yang 5
Chien-Chung Chen 6
Chao-Hsuan Chen 6Yu-Chuan Liu 2
Department of Biochemistry and Molecular Cell Biology, School of Medicine, College of Medicine, Taipei Medical University, Taiwan 1
Department of Biochemistry and Molecular Cell Biology, School of Medicine, College of Medicine, Taipei Medical University; Biomedical Mass Imaging Research Center, Taipei Medical University, Taiwan 2
Department of Materials Science and Engineering, Vanung University, Chung-Li City, Taiwan 3
Graduate Institute of Medical Science, College of Medicine, Taipei Medical University, Taiwan 5
Graduate Institute of Biomedical Materials and Tissue Engineering, College of Oral Medicine, Taipei Medical University, Taiwan 6
Dry plasma treatment and wet chemical corrosion are two of the most popularly methods used for etching silicate glasses. However, the former is laborious; while the latter is environment-unfriendly. In wet etching, environment-unfriendly etchants such as NaOH, H2SO4 and HF were always used and energy-consumed heating process was also reported. Here we report an innovative and facile strategy for etching silicate glasses utilizing vapor from hot electron-activated (HEA) water at room temperature. The activated pH-neutral water has a weakly hydrogen-bonded structure and is stabilized by the decayed hot electron. The distinct structure, as compared to conventional deionized (DI) water, makes it more vapor water molecules available. Moreover, the activated water is electron-rich, which is responsible for facile fabrication of glass nanostructures. After three hours exposure to vapor of activated water at room temperature, the etched glass developed an evenly nanoscale-granulated surface morphology. After etching the contact angle recorded on the nanostructured glass is significantly increased. Compared to an obtained nanoscale-flat surface using vapor from DI water, the resulting nanostructured glass exhibits excellent advantages in applications for obtaining uniform signal intensity of surface-enhanced Raman scattering and strong adhesion of deposited metal on it. Moreover, the proposed strategy is effective for various silicate glasses, silicon wafers, and even metal films. This innovative concept has emerged as a promising strategy on environment-friendly nanostructured etching.
Click to View
Click to View
Click to View
Click to View
Click to View
Click to View
Click to View